发明名称 SEMICONDUCTOR-CLEANING SYSTEM AND ITS DRIVE METHOD
摘要 PROBLEM TO BE SOLVED: To provide a semiconductor-cleaning system and its drive method which can interlock a cleaning system, when chemical supply errors are produced. SOLUTION: A semiconductor-cleaning system containing a ultra-pure water cleaning part for removing particles or chemicals on a surface of a wafer, and a chemical-cleaning part for removing an organic substance or an oxide on the surface of the wafer, and further contain a sensor part for detecting the chemical supply state of the chemical-cleaning part, a control part for determining whether to interlock the cleaning system by the data of the sensor part, and a warning part for issue a warning that chemicals have not been supplied to the chemical cleaning part, according to the control signal of the control part. COPYRIGHT: (C)2003,JPO
申请公布号 JP2003203895(A) 申请公布日期 2003.07.18
申请号 JP20020368797 申请日期 2002.12.19
申请人 SAMSUNG ELECTRONICS CO LTD 发明人 PARK CHOUL-GUE;KIM DEOK YONG
分类号 H01L21/304;G06F17/00;H01L21/00;(IPC1-7):H01L21/304 主分类号 H01L21/304
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