| 发明名称 |
MEANS AND METHOD FOR STRUCTURING A SUBSTRATE WITH A MASK |
| 摘要 |
Means and method for structuring a substrate by means of a multi-layered mask (1, 2, 3, 4), characterised in that the mask comprises at least one layer (1) made from a wet-structured dielectric which is resistant to a dry-etching. An undesirable etching of the substrate is thus avoided. |
| 申请公布号 |
WO03027767(A3) |
申请公布日期 |
2003.07.17 |
| 申请号 |
WO2001DE03519 |
申请日期 |
2001.09.11 |
| 申请人 |
INFINEON TECHNOLOGIES AG;KACHEL, ROBERT;FRANZ, GERHARD |
发明人 |
KACHEL, ROBERT;FRANZ, GERHARD |
| 分类号 |
H01L21/033;H01L21/3213 |
主分类号 |
H01L21/033 |
| 代理机构 |
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