发明名称 PLASMA CHEMICAL VAPOR DEPOSITION METHODS AND APPARATUS
摘要 A preform substrate tube 20 is located in a plasma furnace 52. Gaps 58 along the tube result in the generated plasma 21 which flows in a spiral manner: The plasma 21 has reactants which react and coat the inside of the tube with a glass soot material.
申请公布号 WO03057635(A1) 申请公布日期 2003.07.17
申请号 WO2002US34561 申请日期 2002.10.28
申请人 CORNING INCORPORATED 发明人 HOUSE, KEITH, L.;KHANNA, SAMIR;LANE, BARTON, G., III;MAZUMDER, PRANTIK
分类号 C03B37/018;(IPC1-7):C03B37/018 主分类号 C03B37/018
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