发明名称 |
METHOD AND DEVICE FOR SURFACE-TREATING SUBSTRATES |
摘要 |
The invention concerns a method for surface treatment of at least one electrically conducting substrate or a substrate that has been coated so as to be conducting (1) by means of a gas placed in the region of an electric discharge (2). The discharge region is restricted by at least two essentially opposite sides of the substrate surface to be treated (7). This process is especially suitable for treating band-shaped and continuously supplied substrates.
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申请公布号 |
US2003134051(A1) |
申请公布日期 |
2003.07.17 |
申请号 |
US20000529192 |
申请日期 |
2000.06.26 |
申请人 |
JUNG THOMAS;KLAGES CLAUS-PETER |
发明人 |
JUNG THOMAS;KLAGES CLAUS-PETER |
分类号 |
C23C16/50;C23C16/54;H01J37/32;H05H1/24;(IPC1-7):B05D3/00 |
主分类号 |
C23C16/50 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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