发明名称 Semiconductor device and method of fabricating the same
摘要 A release layer composed of AlGaAs, a strain layer, a strain compensation layer composed of an InGaAs, and a component layer are formed on a GaAs substrate. The component layer includes a DBR film. A recess for defining a bent region is formed in the component layer. The component layer, the strain compensation layer, the strain layer, and the release layer are removed in an approximately U shape, thereby forming a groove. The release layer under the strain layer is selectively removed. The strain layer is bent at a region below the recess so as to relax strain caused by the difference in the lattice constant between the InGaAs layer and the GaAs layer, and the component layer stands perpendicularly to the GaAs substrate.
申请公布号 US2003132444(A1) 申请公布日期 2003.07.17
申请号 US20030352027 申请日期 2003.01.28
申请人 ATR ADVANCED TELECOMMUNICATIONS RESEARCH INSTITUTE INTERNATIONAL 发明人 VACCARO PABLO O.
分类号 B81B3/00;B81C1/00;H01L33/00;H01L33/20;H01S5/02;H01S5/14;H01S5/183;(IPC1-7):H01L27/15 主分类号 B81B3/00
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