PROCESS FOR PRODUCING AN IMAGE USING A FIRST MINIMUM BOTTOM ANTIREFLECTIVE COATING COMPOSITION

摘要

Disclosed is a process for forming an image on a substrate, comprising the steps of: a coating on the substrate a first layer of a radiation sensitive, antireflective composition b coating a second layer of a photoresist composition onto the first layer of the antireflective composition c selectively exposing the coated substrate from step b to actinic radiation and d developing the exposed coated substrate from step c to form an image wherein both the photoresist composition and the antireflective composition are exposed in step c both are developed in step d using a single developer wherein the antireflective composition of step a is a first minimum bottom antireflective coating B.A.R.C. composition, having a solids content of up to about 8% solids, and a maximum coating thickness of the coated substrate of [] wherein lambd, is the wavelength of the actinic radiation of step c and n is the refractive index of the B.A.R.C. composition.