发明名称 GROOVED ROLLERS FOR A LINEAR CHEMICAL MECHANICAL PLANARIZATION SYSTEM
摘要 <p>In a linear chemical mechanical planarization (CMP) systems (114), a surface of each roller (160a), (160b) of a pair of rollers is disclosed which includes a first set of grooves (150a) covering a first portion of the surface of the roller where the first set of grooves (150a) has a first pitch that angles outwardly toward a first outer edge of the roller. The surface also includes a second set of grooves (150b) covering a second portion of the surface of the roller where the second set of grooves (150b) has a second pitch that angles outwardly toward a second outer edge of the roller with the second pitch angling away from the first pitch. The surface further includes a first set of lateral channels (202a) arranged along the first portion, and a second set of lateral channels (202b) arranged along the second portion. The first set of lateral channels (202a) crosses the first set of grooves (150a), and the second set of lateral channels (202b) crosses the second set of grooves (150b).</p>
申请公布号 WO2003057405(A1) 申请公布日期 2003.07.17
申请号 US2002040941 申请日期 2002.12.20
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