| 摘要 |
<p>A stamper having a sharp uneven pattern and an excellent surface state. A light absorbing layer (103) and a photoresist layer (104) are formed in this order on a substrate (102), a latent image is formed in the photoresist layer (104) and developed to form an uneven pattern (106), and a photoresist master disk (100) is manufactured. An Ni thin film (108) is formed on the uneven pattern (106) on the photoresist master disk (100) by sputtering or vapor deposition, an Ni film (110) is formed on the Ni thin film (108), and the Ni thin film (108) and the Ni film (110) are separated from the photoresist master disk (100) to form a stamper (120).</p> |
