RUTHENIUM COMPOUNDS, PROCESS FOR THEIR PREPARATION, AND RUTHENIUM-CONTAINING THIN FILMS MADE BY USING THE COMPOUNDS

摘要

Bis(cyclopentadienyl)ruthenium complex having a content of at least one member selected from among sodium, potassium, calcium, iron, nickel and zinc of 5ppm or below; and bis(cyclopentadienyl)ruthenium complex incorporated with 10 to 100ppm of rhenium. The complexes are suitable for metalorganic chemical vapor deposition (MOCVD) and can give ruthenium -containing thin films.