发明名称 |
METHOD FOR REDUCING DEFECTS OF IMAGE SENSOR CHIP IN BACK GRIND PROCESS |
摘要 |
PURPOSE: A method for reducing defects of an image sensor chip in a back grind process is provided to improve yield of a back grind process by performing a back grind process before a color filter process. CONSTITUTION: A plurality of input and output pads(M1.M2) is formed on an upper portion of a wafer(21a) including unit pixels. A protective layer(23) is formed on the upper portion of the wafer including the input and output pads. A back grind process for a back face of the wafer is performed. An organic material pattern is formed on the protective layer. The organic material pattern includes a color filter(26) and a micro lens(28). The input and output pads are opened by etching selectively the protective layer after the organic material pattern is formed.
|
申请公布号 |
KR20030060603(A) |
申请公布日期 |
2003.07.16 |
申请号 |
KR20020001369 |
申请日期 |
2002.01.10 |
申请人 |
HYNIX SEMICONDUCTOR INC. |
发明人 |
LIM, BU TAEK |
分类号 |
H01L27/146;(IPC1-7):H01L27/146 |
主分类号 |
H01L27/146 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|