发明名称 METHOD FOR REDUCING DEFECTS OF IMAGE SENSOR CHIP IN BACK GRIND PROCESS
摘要 PURPOSE: A method for reducing defects of an image sensor chip in a back grind process is provided to improve yield of a back grind process by performing a back grind process before a color filter process. CONSTITUTION: A plurality of input and output pads(M1.M2) is formed on an upper portion of a wafer(21a) including unit pixels. A protective layer(23) is formed on the upper portion of the wafer including the input and output pads. A back grind process for a back face of the wafer is performed. An organic material pattern is formed on the protective layer. The organic material pattern includes a color filter(26) and a micro lens(28). The input and output pads are opened by etching selectively the protective layer after the organic material pattern is formed.
申请公布号 KR20030060603(A) 申请公布日期 2003.07.16
申请号 KR20020001369 申请日期 2002.01.10
申请人 HYNIX SEMICONDUCTOR INC. 发明人 LIM, BU TAEK
分类号 H01L27/146;(IPC1-7):H01L27/146 主分类号 H01L27/146
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