| 摘要 |
PURPOSE: A method is provided to reduce procedures for forming an electrode layer on the substrate by permitting the first dielectric layer to serve as a mask for etching a transparent thin film layer. CONSTITUTION: A method comprises a step of forming a transparent electrode layer on a front substrate(20); a step of forming a metal bus electrode(22) having a predetermined pattern on the transparent electrode layer; a step of forming a dielectric layer(23) on the metal bus electrode in such a manner that the dielectric layer has a width same as the width of the transparent electrode; and a step of forming a transparent electrode(21) having a predetermined pattern by removing the transparent electrode layer exposed by the dielectric layer.
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