发明名称 INSPECTION APPARATUS FOR MEASURING PELLICLE ROTATION STATE OF MASK AND INSPECTION METHOD THE SAME
摘要 PURPOSE: An inspection apparatus for measuring a pellicle rotation state of mask and its inspection method are provided to be capable of improving the accuracy of measurement by using calipers and minimizing the adsorption of particles on the pellicles. CONSTITUTION: An inspection apparatus is provided with a work table(140) used as a base portion capable of being installed with an arbitrary apparatus, a rotator(100) capable of being rotated, installed on the work table for loading a mask(120) attached with pellicles(130) using a loading part(110), a measuring part(200) installed near the lateral portion of the rotator on the work table for measuring the distance between the edge portion of the mask and the pellicles using a calipers(210), and a measuring part fixing valve capable of moving and fixing the measuring part using an air cylinder(220).
申请公布号 KR20030060199(A) 申请公布日期 2003.07.16
申请号 KR20020000745 申请日期 2002.01.07
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 KIM, SU HYEON
分类号 H01L21/66;(IPC1-7):H01L21/66 主分类号 H01L21/66
代理机构 代理人
主权项
地址