| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method for forming a photocatalyst film which has photocatalyst performance of high sensitivity. <P>SOLUTION: In this method for forming the photocatalyst film, an SiO<SB>2</SB>film is laminated on a TiO<SB>2</SB>film by sputtering in vacuum. When the SiO<SB>2</SB>film is formed, an Si target containing a specified metallic additive is used and the sputtering is performed. In such a case, for example, nickel (Ni), copper (Cu) and tungsten (W) are preferably used as the metallic additive. It is preferable that the amount of the metallic additive contained in the Si target is 10<SP>-2</SP>-10<SP>-4</SP>wt.%. <P>COPYRIGHT: (C)2003,JPO |
