| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a metal foil laminate capable of preventing the problem due to the penetration of an etching solution, capable of being simply manufactured and capable of also sufficiently obtaining the reduction effect of the dielectric constant of the whole of an insulating layer, and to provide a method for manufacturing the same. <P>SOLUTION: The method for manufacturing the metal foil laminate includes a process for forming a substrate film layer comprising at least partially imidated polyamic acid on a metal foil, a process for forming a precursor porous layer on the substrate film layer by a wet film forming method using a solution containing a polyamic acid, and a process for performing at least the imide convertion of the precursor porous layer. <P>COPYRIGHT: (C)2003,JPO</p> |
