发明名称 Ion beam processing position correction method
摘要 The present invention provides a focused ion beam method in which positional correction is performed with reference to reference points on a sample and for carrying out processing using an ion beam, in which reference point conformation does not take up a lot of time, and which is capable of accurate fine processing. The present invention performs high precision processing with correction performed at short intervals using reference mark confirmation when fine processing requiring accuracy is performed, while positional correction is carried out at long intervals when accuracy is not required, which means there is no wasted time because inefficient correction processing is omitted.
申请公布号 US6593583(B2) 申请公布日期 2003.07.15
申请号 US20010754649 申请日期 2001.03.22
申请人 SEIKO INSTRUMENTS INC. 发明人 IWASAKI KOUJI
分类号 H01J37/317;G01N23/20;G01Q40/02;G03F7/20;H01L21/027;H01L21/302;(IPC1-7):H01J37/08;G21G5/00;G21K5/10;G21K7/00;G01N23/00 主分类号 H01J37/317
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