| 发明名称 |
Dual collimated deposition apparatus and method of use |
| 摘要 |
A dual collimation deposition apparatus and method are disclosed in which the dual collimation apparatus includes at least a long-throw collimator in combination with one or more physical collimators. A new physical collimator and shield design are also disclosed for improved process uniformity and increased equipment productivity.
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| 申请公布号 |
US6592728(B1) |
申请公布日期 |
2003.07.15 |
| 申请号 |
US19980130527 |
申请日期 |
1998.08.04 |
| 申请人 |
VEECO-CVC, INC. |
发明人 |
PARANJPE AJIT;SCHWARTZ PETER;KOOLS JACQUES;SONG KANG;HEIMANSON DORIAN;MOSLEHI MEHRDAD |
| 分类号 |
C23C14/04;C23C14/22;C23C14/34;G11B5/31;H01J37/34;(IPC1-7):C23C14/34 |
主分类号 |
C23C14/04 |
| 代理机构 |
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