COMPOSITION OF ANTI-REFLECTIVE COATING AND PATTERN FORMING METHOD OF SEMICONDUCTOR DEVICE USING THE SAME

摘要

PURPOSE: A composition of an anti-reflective coating and a pattern forming method of a semiconductor device using the same are provided to be capable of obtaining vertical pattern by containing thermal oxidation barrier material to the anti-reflective coating. CONSTITUTION: A composition of an anti-reflective coating comprises an anti-reflective coating compound and a thermal oxidation barrier material. Clariant 1C5D is used as the anti-reflective coating compound. Also, the thermal oxidation barrier material is one selected from group consisting of 2-hydrohexylparatoluensulfonate and 2-itrobenzylparatoluensulfonate.