| 摘要 |
PROBLEM TO BE SOLVED: To provide a method for manufacturing a pattern transfer mold capa ble of providing a deep and precise comb type pattern at a low cost and high speed, applicable to a pattern transfer method using a comb type press. SOLUTION: An etch mask thin film 2 is formed on a molding substrate 1, a circuit pattern is formed of a molding resist film 3 on the thin film 2 by photolithography, a circuit pattern is formed on the thin film 2 by wet etching using the resist film 3 as the mask, the substrate 1 is subjected to wet etching using the circuit-carrying thin film 2 as the mask, and then the resist film 3 and the thin film 2 are removed. COPYRIGHT: (C)2003,JPO |
