| 摘要 |
PROBLEM TO BE SOLVED: To provide an ion source device capable of generating ion beam under clean environment by preventing the device from being contaminated by an RF antenna. SOLUTION: This ion source device S comprises a discharge means 3 for discharging, a discharge chamber 1 having an opening 12 and holding plasma generated by discharging, and an extraction electrode 6 for extracting ion beam from plasma by closing the opening 12 of a discharge chamber 1. The discharge means 3 is disposed on the outside of a side face 13 adjacent to the face of the discharge chamber 1 having the opening 12. The discharge chamber 1 is formed of an insulator. COPYRIGHT: (C)2003,JPO
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