| 摘要 |
PROBLEM TO BE SOLVED: To improve throughput without reducing exposure accuracy during multiple exposure. SOLUTION: When measuring a positional relationship between a first lot wafer and a reticle, a reticle microscope is focused (step 412), and its state is stored (step 414). Then, if the reticle microscope is necessary to be focused when measuring a positional relationship between a specified n-th or later wafer and the reticle, it is focused by using the stored information on focus state of the reticle microscope (step 428). Thus, focus operation can be made quick when compared with a case when photographing of marks and adjusting of focus state are repeated every time the reticle is exchanged. In addition, the focus state is always identical, so that focus accuracy is hardly reduced. COPYRIGHT: (C)2003,JPO |
