| 摘要 |
PROBLEM TO BE SOLVED: To provide a mask body for preventing, in an etching process, the separation of the mask body that occurs in the vicinity of the end of a material to be etched. SOLUTION: The mask body 22a is composed of an aggregate in which a plurality of linear masks 22b are formed on a surface 1a of the material to be etched. Portions of the linear masks 22b, which are located in the vicinity of the end 1A of the material to be etched, are formed into portions 22c having larger widths than other portions of the linear masks 22b. Central portions of the linear masks 22b are also formed to have larger widths, if necessary. COPYRIGHT: (C)2003,JPO |
