METHOD FOR INSPECTING IMAGE FORMATION OPTICAL SYSTEM, METHOD FOR ADJUSTING AND CORRECTING POSITION DETECTION DEVICE, ALIGNER, AND EXPOSING METHOD

摘要

PROBLEM TO BE SOLVED: To provide a method for inspecting an image formation optical system by which the nonuniformity of illuminance distribution of image formation light flux can be inspected conveniently. SOLUTION: A pattern image is detected photoelectrically while changing a specified pattern position along the light axis of an image formation optical system. A Q value showing an intensity difference between right and left edges of a signal obtained from the photoelectric detection of a pattern image is approximated to a specified order function, related to the defocus quantity Z of a pattern on a focus position corresponding with Gaussian mirror surface of the image formation optical system. On the basis of a relationship between a value of constant term of the function and a coefficient of even-number order term of the function, the nonuniformity of illuminance distribution of image formation light flux is inspected by using the image formation optical system. COPYRIGHT: (C)2003,JPO