发明名称 |
CHARGED PARTICLE BEAM OPTICAL DEVICE, DIAPHRAGM FOR CHARGED PARTICLE BEAM OPTICAL DEVICE, CHARGED PARTICLE BEAM CONTROL METHOD, AND OBJECT INSPECTING DEVICE, OBJECT INSPECTING METHOD, AND SEMICONDUCTOR ELEMENT USING THESE |
摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a charged particle beam optical device capable of reducing expansion of a charged particle beam due to aberration in an image surface. <P>SOLUTION: A secondary column 2 having a secondary optical system 20 is provided to form an image IF of an illuminated range OF on an object surface OB on an image surface IM by introducing a secondary beam emitted from the illuminated range OF extended in an X-axis direction on the object surface OB. At this time, an aperture diaphragm AS having an oval aperture form having a longer axis in a Y-axis direction perpendicular to the X-axis direction in which the illuminated range OF is extended is provided on a track of the secondary beam. The ratio of the longer axis and the shorter axis of the aperture form are set in such a way that the secondary beam emitted from a point A' at an end part of the range OF in the X-axis direction where the illuminated range OF is extended has extensionδx andδy by aberration of roughly similar size respectively in the X-axis direction where the image IF is extended and the Y-axis direction perpendicular to that on the image surface IM. <P>COPYRIGHT: (C)2003,JPO</p> |
申请公布号 |
JP2003197140(A) |
申请公布日期 |
2003.07.11 |
申请号 |
JP20010392552 |
申请日期 |
2001.12.25 |
申请人 |
EBARA CORP;NIKON CORP |
发明人 |
NIN TAKEAKI |
分类号 |
G01B15/00;G01B15/08;G01N23/225;G21K1/02;G21K5/04;H01J37/09;H01J37/12;H01J37/153;H01L21/66;(IPC1-7):H01J37/09 |
主分类号 |
G01B15/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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