DEVELOPING DEVICE AND DEVELOPING METHOD

摘要

PROBLEM TO BE SOLVED: To provide a compact developing device and a developing method by which a developing time of thick-film resist can be reduced and a large object to be treated be developed. SOLUTION: This developing device is designed to adjust the temperature of a developer supplied from a developer supply tank through a heat exchanger and to supply it to a developing tank. An object to be treated is vertically held in the developing tank for single sheet processing, and a temperature- adjusted developer is circulated in the developing device. COPYRIGHT: (C)2003,JPO