| 摘要 |
PROBLEM TO BE SOLVED: To provide a polysilazane treatment solvent which has excellent solubility for polysilazane and does not affect characteristics of an underlayer or a polysilazane coating film and to provide a method for treating the polysilazane using the same. SOLUTION: The single or mixed polysilazane treatment solvent contains one or more types selected from the group composed of xylene, anisole, decalin, cyclohexane, methylcyclohexane, ethylcyclohexane, rimonene, hexane, octane, nonane, decane, a 8-11C alkane mixture, a 8-11C aromatic hydrocarbon mixture, an aliphatic/alicyclic hydrocarbon mixture containing 8 or more C aromatic hydrocarbon of 5 to 25 wt.%, and dibutyl ether, in such a manner that fifty or less pieces of fine particles each of which is 0.5 or more micron in size are included in 1 ml of the solvent. The treatment of the polysilazane includes the edge rinsing of the polysilazane film coated on a semiconductor substrate and the rising of a rear surface. A moisture content of the solvent is well 100 ppm or less. COPYRIGHT: (C)2003,JPO
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