发明名称 SUPPORTING BASE FOR THIN PLATE PROCESSING WORK
摘要 PROBLEM TO BE SOLVED: To provide a supporting base (12) which can very easily transfer a semiconductor wafer even when a thin plate work such as the semiconductor wafer (2) is ground to become extremely thin. SOLUTION: A magnetic tape or a magnetized tape is used as a tape (10) to be adhered to the single surface of a thin plate work or to the surface of the semiconductor wafer (2). The supporting base (12) is formed at least partly with a porous material and also includes an at least partly magnetized or magnetic supporting region (14). COPYRIGHT: (C)2003,JPO
申请公布号 JP2003197584(A) 申请公布日期 2003.07.11
申请号 JP20010390114 申请日期 2001.12.21
申请人 DISCO ABRASIVE SYST LTD 发明人 KITAMURA MASAHIKO
分类号 H01L21/304;H01L21/00;H01L21/68;H01L21/687;(IPC1-7):H01L21/304 主分类号 H01L21/304
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