| 发明名称 |
PROTECTIVE LAYER FOR MULTILAYERS EXPOSED TO X-RAYS |
| 摘要 |
An optical element for diffracting x-rays that includes a substrate, a diffraction structure applied to the substrate, the diffraction structure including an exterior surface facing away from the substrate and the diffraction structure capable of diffracting x-rays and a protective layer applied to the exterior surface.
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| 申请公布号 |
US2003128810(A1) |
申请公布日期 |
2003.07.10 |
| 申请号 |
US20020043817 |
申请日期 |
2002.01.10 |
| 申请人 |
OSMIC, INC. |
发明人 |
VERMAN BORIS;JOENSEN KARSTEN;PLATONOV YURIY;SESHADRI SRIVATSAN |
| 分类号 |
G21K1/06;(IPC1-7):G21K1/06 |
主分类号 |
G21K1/06 |
| 代理机构 |
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