发明名称 |
Exposure method, exposure apparatus, method for adjusting the exposure apparatus, and device manufacturing method |
摘要 |
Attention is paid to the phenomenon that a static image distortion characteristic is averaged in the width of a projection area in a scanning direction and becomes a dynamic image distortion characteristic, when a mask pattern is scan-exposed onto a photosensitized substrate by a projection exposure apparatus. At least a random component included in the dynamic image distortion characteristic is corrected by arranging an image correction plate obtained by locally polishing the surface of a transparent parallel plate. Correction plates which minimize other aberrations beforehand are manufactured and installed within a projection optical path, considering that also the other aberrations are averaged and become dynamic aberration characteristics at the time of scan-exposure.
|
申请公布号 |
US2003128344(A1) |
申请公布日期 |
2003.07.10 |
申请号 |
US20020321597 |
申请日期 |
2002.12.18 |
申请人 |
NIKON CORPORATION |
发明人 |
NISHI KENJI |
分类号 |
G03F7/20;(IPC1-7):G03B27/68 |
主分类号 |
G03F7/20 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|