| 摘要 |
<p>Step 11 extracts parameters such as temperature, pressure, and humidity in an apparatus or a convey time in the apparatus as environment conditions around the substrate affecting formation of a resist pattern and collects only normal data values used when forming a desired resist pattern. Step 12 calculates at least two main components by applying the main component analysis technique to the normal data values, so that step 13 can create a normal region. By using this normal region created as an index when forming a resist pattern on a substrate as an actual product, it is possible to easily determine whether the resist pattern is normal.</p> |
