| 摘要 |
<p>A solvent which is a single or mixed solvent comprising at least one member selected from the group consisting of xylene, anisole, decalin, cyclohexane, cyclohexene, methylcyclohexane, ethylcyclohexane, limonene, hexane, octane, nonane, decane, a mixture of C8 to C11 alkanes, a mixture of C8 to C11 aromatic hydrocarbons, an aliphatic/alicyclic hydrocarbon mixture containing 5 to 25 wt.% C8 or higher aromatic hydrocarbon, and dibutyl ether and in which the number of fine particles of 0.5 microm or larger contained per mL of the solvent is 50 or smaller. This solvent is used to treat a polysilazane. Examples of the polysilazane treatment include rinsing of the edges of a polysilazane film formed by spin coating on, e.g., a semiconductor substrate and rinsing of the back of the coated substrate. The water content of the solvent is preferably 100 ppm or lower.</p> |
