发明名称 Wafer splitting method using cleavage
摘要 Notches are formed in a surface of a wafer on which semiconductor elements have been formed. Then, a surface protect tape is stuck to the element formed surface of the wafer. Subsequently, the wafer is cleaved along a crystal orientation using the notches as starting points. Finally, a back surface of the wafer is grounded.
申请公布号 US2003129809(A1) 申请公布日期 2003.07.10
申请号 US20020306008 申请日期 2002.11.29
申请人 TAKYU SHINYA;KUROSAWA TETSUYA 发明人 TAKYU SHINYA;KUROSAWA TETSUYA
分类号 H01L21/304;H01L21/301;H01L21/78;(IPC1-7):H01L21/301 主分类号 H01L21/304
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