METHOD FOR CORRECTING PATTERN AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE

摘要

PROBLEM TO BE SOLVED: To correct a design pattern to a shape suited to mask plotting or inspection by simple processing.

SOLUTION: In a pattern correcting method to be executed by a computer, 1st correction for sides satisfying a prescribed condition out of sides constituting a designed pattern is performed by calculating correction values obtained considering an optical proximity effect. Then 2nd correction for sides not satisfying the prescribed condition is performed by using the correction value of the side adjacent to the side not satisfying the prescribed condition out of the sides corrected by the 1st correction and the sides corrected by the 1st correction are connected to each other with a segment.

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