发明名称 MASK FOR MEASURING APPARATUS AND METHOD FOR CREATING AND EDITING WAVEFORM
摘要 PROBLEM TO BE SOLVED: To create and edit a waveform template or mask for a testing measuring apparatus without using external apparatus. SOLUTION: A mask editor is called from an application operating on the measuring apparatus displaying a context (24). The context from the application is displayed as a reference, and the current mask unrelated to the context is displayed as part of the mask editor (26 and 28). The current mask for the reference is edited to define a new mask (32) and the mask editor is exited to return to the application (34, 36) and apply the new mask to the context within the application (38). COPYRIGHT: (C)2003,JPO
申请公布号 JP2003194855(A) 申请公布日期 2003.07.09
申请号 JP20020320848 申请日期 2002.11.05
申请人 TEKTRONIX JAPAN LTD 发明人 BERNARD KYLE L;BRYANT CRAIG D
分类号 G01R13/20;G01R13/02;(IPC1-7):G01R13/20 主分类号 G01R13/20
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