| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a resist material which is sensitive to high-energy rays and excellent in the sensitivity at a wave length of 200 nm or less, especially of 170 nm or less. <P>SOLUTION: The polymer compound contains repeating units expressed by formulae (1a) and (1b) (wherein R<SP>1</SP>and R<SP>2</SP>are each H, F, an alkyl group or a fluorinated alkyl group; R<SP>3</SP>is F or a fluorinated alkyl group; R<SP>4</SP>is an acid unstable group, a tightly junctioning group or a fluorinated alkyl group; R<SP>5</SP>is an oxygen atom or a sulfur atom; R<SP>6a</SP>, R<SP>6b</SP>, R<SP>6c</SP>and R<SP>6d</SP>are each H, OH, -(CH<SB>2</SB>)<SB>d</SB>C(R<SP>7</SP>)<SB>2</SB>(OR<SP>8</SP>), -(CH<SB>2</SB>)<SB>d</SB>CO<SB>2</SB>R<SP>8</SP>, an alkyl group or a fluorinated alkyl group, but R<SP>7</SP>is H, F, or a fluorinated alkyl group and R<SP>8</SP>is H, an acid unstable group, a tightly junctioning group or a fluorinated alkyl group; and 0<a<1, 0<b<1, 0<a+b≤1, c=0 or 1, and 0≤d≤6). <P>COPYRIGHT: (C)2003,JPO |
