PHOTORESIST STRIPPER COMPOSITION

摘要

PROBLEM TO BE SOLVED: To provide a novel photoresist stripper composition. SOLUTION: A thinner composition as the photoresist stripper composition consists of 8 to 95 wt.% normal butyl acetate, 0.1 to 13 wt.%γ-butyrolactone and 3 to 80 wt.% of a non-acetate ester compound. The thinner composition may also consist of 42 to 90 wt.% normal butyl acetate, 1 to 13 wt.%γ- butyrolactone and 5 to 45 wt.% polyhydric alcohol derivatives. Photoresist applied on an edge part and a rear side surface part of a substrate can be selectively stripped by using the thinner composition. The photoresist applied on the entire surface of the substrate can also be stripped by using the thinner composition. Various kinds of photoresist materials can be stripped by using the inexpensive thinner composition. COPYRIGHT: (C)2003,JPO