METHOD FOR FORMING VACUUM DEPOSITED FILM

摘要

PROBLEM TO BE SOLVED: To provide a method which is an electron beam evaporation method and by which a vacuum deposited film superior in adhesion to the conventional one can be deposited onto a synthetic-resin substrate.

SOLUTION: In this method, an electron beam is projected on (made incident upon) an evaporation source in a vacuum chamber 12 to deposit the vacuum deposited film onto the synthetic-resin substrate 28. An electron capture box 30 to which a positive bias voltage is applied is disposed in the vicinity of the upper part of a hearth 14 to reduce the amount of the backscattered electrons of the electron beam reaching the synthetic-resin substrate.

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