| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To achieve the improvement in the throughput of a manufacturing process step and inspecting process step for a phase shift mask and the lower cost thereof by making inspection and quality control of high accuracy possible while simplifying the inspecting process step and manufacturing process step for performance to give rise to a phase difference in the phase shift mask. <P>SOLUTION: A light shielding film 2 of a segment corresponding to a reference pattern 4 is selectively etched to be made thinner in film thickness than the light shielding film 2 of another segment. A trench 5 is dug into a transparent substrate 1 by etching and the light shielding film 2 of the segment corresponding to the reference pattern 4 is also etched to make the residual film 9 of the light shielding film 2 of this segment into the prescribed thickness. The remaining film 9 is removed at need. <P>COPYRIGHT: (C)2003,JPO</p> |
