| 摘要 |
PROBLEM TO BE SOLVED: To provide a silica slurry which has a low viscosity in spite of being highly concentrated, and can easily be handled. SOLUTION: This highly concentrated silica slurry is characterized by comprising the mixture of colloidal silica with fumed silica in a liquid solvent in a silica concentration of≥40%. The fumed silica is preferably doped with alumina and/or potassium oxide. The highly concentrated silica slurry has a low viscosity in spite of being highly concentrated, scarcely changes the viscosity with the passage of time, has both the advantage of the colloidal silica and the advantage of the fumed silica, and has a relatively large polishing rate and excellent polishing accuracy on a chemical polishing treatment (CMP), or the like. COPYRIGHT: (C)2003,JPO |
