发明名称 METHOD FOR PLATEMAKING OF PHOTOSENSITIVE LITHOGRAPHIC PRINTING PLATE
摘要 PROBLEM TO BE SOLVED: To provide a method for platemaking of a photosensitive lithographic printing plate having significantly improved image strength and particularly excellent printing durability in the initial stage of printing. SOLUTION: The method for platemaking of the photosensitive lithographic printing plate, in which, after exposing a photosensitive lithographic printing plate having a photopolymerizable photosensitive layer containing ethylenic monomers, a photopolymerization initiator and a polymer binder formed on a supporting body to laser light; developing; cleaning with water; and applying a gum liquid, are successively carried out, is characterized in that a step of drying the printing plate is carried out in a process between the cleaning process and the application process of the gum liquid. COPYRIGHT: (C)2003,JPO
申请公布号 JP2003195526(A) 申请公布日期 2003.07.09
申请号 JP20010396938 申请日期 2001.12.27
申请人 MITSUBISHI CHEMICALS CORP 发明人 OKAMOTO HIDEAKI;TAKADA TERUO;KATAYAMA TOSHIAKI;TOSHIMITSU ERIKO
分类号 G03F7/40;G03F7/00;(IPC1-7):G03F7/40 主分类号 G03F7/40
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