PATTERN FORMING DEVICE AND ITS METHOD

摘要

PROBLEM TO BE SOLVED: To make it possible to uniform the temperature of a glass substrate in plotting a pattern in a device for manufacturing a reticule.

SOLUTION: A dummy mask 41 including a thermometer 41a in its inside is held on an X-Y stage 21. A change in the temperature of the dummy mask 41 in plotting an original pattern by a pattern plotter 27 is measured by the thermometer 41a. Then a glass substrate is held on the X-Y stage 21 and the original pattern is plotted by the plotter 27. In this case, the set temperature of a constant temperature container 31 arranged in the vicinity of the glass substrate is controlled independently of a plotting container 11.

COPYRIGHT: (C)2003,JPO