| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a negative resist composition making both of high sensitivity and high resolution compatible with each other and having excellent reproducibility for a beam profile. <P>SOLUTION: The negative resist composition in characterized by containing (A1) a compound which generates a sulfonic acid by irradiation of active rays or radiation, (A2) a compound which generates a specified carboxylic acid by irradiation of active rays or radiation, (B) a resin soluble with an alkali aqueous solution, (C) a compound having an alcohol structure which is excited by the sulfonic acid generated by the component (A1) to decrease the solubility of the resist film, and (D) a solvent. <P>COPYRIGHT: (C)2003,JPO |
