发明名称 |
METHOD FOR REMOVING DAMAGED SUBSTRATE REGION BENEATH COATING |
摘要 |
PROBLEM TO BE SOLVED: To provide a method for removing only a damaged layer without removing a undamaged region of a substrate. SOLUTION: According to the method that the damaged surface layer beneath the coating on a component, the component is inspected in order to evaluate a depth of the damaged substrate layer and a plurality of points over an outer surface of the component are detected in order to determine a three-dimensional outer surface profile. A three-dimensional grinding profile beneath the outer surface profile is established based on the depth of the damaged substrate layer beneath the outer surface profile. The component is ground along the grinding profile such that the damaged substrate layer is substantially removed without significantly removing the undamaged region of the substrate beneath the damaged substrate layer. COPYRIGHT: (C)2003,JPO |
申请公布号 |
JP2003191157(A) |
申请公布日期 |
2003.07.08 |
申请号 |
JP20020344853 |
申请日期 |
2002.11.28 |
申请人 |
GENERAL ELECTRIC CO <GE> |
发明人 |
ANNIGERI RAVINDRA;NELSON WARREN ARTHUR |
分类号 |
G01B21/20;B24B1/00;B24B19/14;B24B49/10;B24B49/12;(IPC1-7):B24B19/14 |
主分类号 |
G01B21/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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