发明名称 |
Organosiloxane polymer, photo-curable resin composition, patterning process, and substrate protective coating |
摘要 |
By blending novel organosiloxane polymers of the invention with a crosslinking agent and a photoacid generator, photo-curable resin compositions are formulated which can be exposed to radiation in a broad wavelength range and readily form a thin film without oxygen attack. From the compositions, fine patterns having improved dry etching resistance can be formed. Cured coatings of the compositions having improved substrate adhesion, heat resistance, and electrical insulation are suitable as a protective film for electric and electronic parts.
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申请公布号 |
US6590010(B2) |
申请公布日期 |
2003.07.08 |
申请号 |
US20010949848 |
申请日期 |
2001.09.12 |
申请人 |
SHIN-ETSU CHEMICALS, CO., LTD. |
发明人 |
KATO HIDETO;UEDA TAKAFUMI;FURIHATA TOMOYOSHI |
分类号 |
G03F7/004;C08F2/46;C08F2/50;C08G8/38;C08G12/46;C08G59/62;C08G77/00;C08G77/42;C08G77/52;C08L83/10;C08L83/14;G03F7/075;H01L21/312;H05K3/28;(IPC1-7):C08G77/00;C08G77/12 |
主分类号 |
G03F7/004 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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