发明名称 |
Photoresist stripper compositions |
摘要 |
A photoresist stripper composition is made up of a mixture of an acetic acid ester, gamma-butyrolactone (GBL), and a non-acetate ester or a poly alkyl alcohol derivative. The acetic acid ester may be at least one of n-butyl acetate, amyl acetate, ethyl aceto-acetate, and isopropyl acetate. The non-acetate ester may be at least one of ethyl lactate (EL), ethyl-3-ethoxy propionate (EEP) and methyl-3-methoxy (MMP). The poly alkyl alcohol derivative may be at least one of propylene glycol monomethyl ester (PGME) and propylene glycol monomethyl ester acetate (PGMEA).
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申请公布号 |
US6589719(B1) |
申请公布日期 |
2003.07.08 |
申请号 |
US20020116030 |
申请日期 |
2002.04.05 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
AHN SEUNG-HYUN;CHON SANG-MUN;CHUNG HOE-SIK;JEON MI-SOOK;BAE EUN-MI;CHOI BAIK-SOON;JANG OK-SEOK |
分类号 |
G03F7/16;G03F7/42;H01L21/027;(IPC1-7):G03C7/42 |
主分类号 |
G03F7/16 |
代理机构 |
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代理人 |
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地址 |
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