| 发明名称 |
Aluminum deposition shield |
| 摘要 |
An aluminum deposition shield substantially improves transfer of radiated heat from within the vacuum chamber, in comparison to a stainless steel deposition shield. The aluminum deposition shield remains cooler during wafer processing and assists in cooling the chamber components.
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| 申请公布号 |
US6589407(B1) |
申请公布日期 |
2003.07.08 |
| 申请号 |
US19970862537 |
申请日期 |
1997.05.23 |
| 申请人 |
APPLIED MATERIALS, INC. |
发明人 |
SUBRAMANI ANANTHA;DAS ASHOK K.;DELAURENTIS LEIF E.;ROSENSTEIN MICHAEL |
| 分类号 |
H05H1/46;C23C14/00;H01J37/32;(IPC1-7):C23C14/34 |
主分类号 |
H05H1/46 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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