| 摘要 |
PROBLEM TO BE SOLVED: To provide a polyimide film wherein the etching time is short in forming a pattern by chemical etching and to provide a laminate. SOLUTION: The polyimide film of≥3.0μm/min in chemical etching speed as the whole of the film is provided by stacking a polyimide layer for a surface modifying layer on at least one side surface of the polyimide layer comprising a pyromellitic acid dianhydride residue and 3,3',4,4'-biphenyltetracarbonate dianhydride residue as a tetracarbonate component for a substrate layer, and a p-phenylenediamine residue and 4,4'-diaminophenyl ether residue as a diamine component. Then, the laminate is provided by stacking an electrically conductive metallic layer on the polyimide film. COPYRIGHT: (C)2003,JPO
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