发明名称 A FERROELECTRIC MEMORY CIRCUIT AND METHOD FOR ITS FABRICATION
摘要 A ferroelectric memory circuit (C) comprises a ferroelectric memory cell in the form of a ferroelectric polymer thin film (F) and first and second electrodes (E1; E2) respectively, contacting the ferroelectric memory cell (F) at opposite surfaces thereof, whereby a polarization state of the cell can be set, switched or detected by applying appropriate voltages to the electrodes (E1; E2). At least one of the electrodes (E1; E2) comprises at least one contact layer (P1; P2), said at least one contact layer (P1; P2) comprising a conducting polymer contacting the memory cell (C), and optionally a second layer (M1; M2) of a metal film contacting the conducting polymer (P1; P2), whereby said at least one of the electrodes (E1; E2) either comprises a conducting polymer contact layer (P1; P2) only, or a combination of a conducting polymer contact layer (P1; P2) and a metal film layer (M1; M2). A method in the fabrication of a ferroelectric memory circuit of this kind comprises steps for depositing a first contact layer of conducting polymer thin film on the substrate, depositing subsequently a ferroelectric polymer thin film on the first contact layer, and then depositing a second contact layer on the top of the ferroelectric polymer thin film.
申请公布号 KR20030059272(A) 申请公布日期 2003.07.07
申请号 KR20037007038 申请日期 2003.05.26
申请人 发明人
分类号 H01L21/312;H01L27/04;G11C11/22;G11C13/02;H01L21/02;H01L21/8246;H01L27/105;H01L27/115;H01L27/12;H01L27/28;H01L51/00;H01L51/30 主分类号 H01L21/312
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