| 摘要 |
PURPOSE: A spin development device is provided to reduce the contact area between a substrate and a vacuum line while keeping the surface area of the vacuum line equal, thereby reducing the amount of static electricity. CONSTITUTION: A spin development device includes a development solution supply for doping a development solution to a substrate, a vacuum chuck(26) for fixing the substrate by vacuum suction, and a motor for rotating the substrate. The vacuum chuck is provided below the substrate and coupled with a rotation shaft for transmitting rotation force to the vacuum chuck from the motor. The rotation shaft is coupled with the motor via a belt connected to first and second pulleys. The vacuum chuck is formed with vacuum holes(40) by a predetermined interval along the internal axial line of the rotation shaft, and vacuum lines(42) are concentrically formed between the holes. On the vacuum lines, a plurality of micro grooves(42a) and micro protrusions(42b) are alternately formed.
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