METHOD FOR FABRICATING X-RAY IMAGE DETECTING DEVICE

摘要

PURPOSE: A method for fabricating an X-ray image detecting device is provided to simplify fabricating process by decreasing the number of photo processes, and to prevent a storage region from being etched in a process for etching a passivation layer by interposing an etch stopper between a gate insulation layer and an active layer. CONSTITUTION: A storage electrode(202) is formed on a glass substrate(200). Respective gates(204) and common electrodes(206) are formed on the substrate including the storage electrode. The active layer(212) is formed on the resultant structure by interposing the gate insulation layer(208). A source/drain(214,216) is formed on the substrate including the active region. The passivation layer(218) exposing the portions corresponding to the source, the gate and the storage electrode is formed on the substrate including the source/drain. Respective pixel electrodes and interconnections are formed on the passivation layer to cover the exposed portions. An optical conductive layer and a conductive electrode are sequentially formed on the substrate including the pixel electrodes and the interconnections.