METHOD FOR FORMING VIA HOLE OF LIQUID CRYSTAL DISPLAY

摘要

PURPOSE: A method for forming a via hole of a liquid crystal display is provided to prevent an AlNd layer from directly contacting with a pixel electrode by maintaining the least thickness of Mo layers, thereby preventing contact resistance from increasing. CONSTITUTION: A silicon oxide film is deposited on a glass substrate(200). Metal layers for forming a gate electrode are deposited on the silicon oxide film in order. The metal layers for forming the gate electrode and the silicon oxide film are etched by a photo-lithography to form a gate insulating film(202) and a gate electrode(204). An insulating film(206) is deposited on a front of the glass substrate. The insulating film is etched by providing SF6 and He etching gas to form a via hole(207) exposing a part of the gate electrode. A transparent conductive film(220) is deposited on the insulating film to cover the via hole.